Mathematical model for the precursor gas residence time in isothermal CVD process of C/C composites
发布时间：2021-07-16
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所属单位：中南大学
发表刊物：TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA
关键字：chemical vapor deposition，residence time，mathematical model
摘要：In the chemical vapor deposition (CVD) process of C/C composites, the dynamics and mechanism of precursor gas flowing behavior were analyzed mathematically, in which the precursor gas was infiltrated by the pressure difference of the gas flowing through felt. Differential equations were educed which characterized the relations among the pressure inside the felt, the pressure outside the felt of the precursor gas and the porosity of the felt as a function of CVD duration. The gas residence time during the infiltration process through the felt was obtained from the differential equations. The numerical verification is in good agreement with the practical process, indicating the good reliability of the current mathematical model
论文类型：期刊论文
学科门类：工学
一级学科：材料科学与工程
文献类型：J
卷号：21
期号：8
页面范围：1833-1839
是否译文：否
发表时间：2011-08-17
收录刊物：SCI