Effects of sputtering pressure on nanostructure and nanomechanical properties of AlN films prepared by RF reactive sputtering
发布时间:2016-07-15
点击次数:
发表刊物:Transactions of Nonferrous Metals Society of China
备注:https://doi.org/10.1016/S1003-6326(14)63417-8
合写作者:Zhiming Yu*, Dou Zhang, Kechao Zhou, Jie Li, Danying Liu, Xiongwei Zhang, Qiuping Wei
文献类型:J
卷号:9
期号:24
页面范围:2845-2855
是否译文:否
发表时间:2014-08-18