中文

一种螺旋轮廓偏置填充优化方法及系统

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  • Release time:2025-12-15

  • Disigner of the Invention:张俊、宋朝霞、李丽娇,田慧敏

  • Type of Patent:Invent

  • State of Patent:Authorized patents

  • Service Invention or Not:no

  • Authorization Date:2021-02-19


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