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一种HABT-C纳米材料及其制备和应用

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  • Release time:2023-08-10

  • School Sign:中南大学

  • Disigner of the Invention:李辉煌; 祖雄兵; 胡姣; 陶娜; 邓留

  • Type of Patent:Invent

  • State of Patent:Authorized patents

  • Application Number:CN202111462047.6

  • Authorization number:CN114177200B

  • Service Invention or Not:no

  • Application Date:2021-12-02

  • Authorization Date:2022-08-19

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