中文

一种硫化铋半导体薄膜的制备方法

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  • Release time:2016-04-02

  • Patent Applicant:赖延清, 孙凯乐, 刘芳洋, 陈建宇, 汪颖, 蒋良兴

  • Disigner of the Invention:中南大学

  • Type of Patent:Invent

  • State of Patent:Pending patent

  • Application Number:01610065059.8

  • Service Invention or Not:no

  • Application Date:2016-02-01


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