中文

一种探地雷达后向投影成像方法及系统,隋浩

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  • Release time:2022-12-20

  • Type of Patent:Invent

  • State of Patent:Authorized patents

  • Authorization number:ZL2022109026459

  • Service Invention or Not:yes

  • Application Date:2022-07-29

  • Publication Date:2022-10-28

  • Authorization Date:2022-10-28


  • Email:

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