Material Removal Model of Chemical Mechanical Polishing for Fused Silica Using Soft Nanoparticles
发布时间：2019-10-18
点击次数：
发表刊物：International Journal of Advanced Manufacturing Te
合写作者：Hu Qing, Chen Guanglin, Liu Defu*
文献类型：J
是否译文：否
Material Removal Model of Chemical Mechanical Polishing for Fused Silica Using Soft Nanoparticles
发布时间：2019-10-18
点击次数：
发表刊物：International Journal of Advanced Manufacturing Te
合写作者：Hu Qing, Chen Guanglin, Liu Defu*
文献类型：J
是否译文：否