G Duan, X Li, X Ma*, W Zhong, S Wang*. High-efficiency adsorption removal for Cu(II) and Ni(II) using a novel acylamino dihydroxamic acid chelating resin. Science of the Total Environment，2023，864：160984. https://doi.org/10.1016/j.scitotenv.2022.160984 （通讯作者）
发布时间：2023-01-04
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