Hydrogen Intercalation: An Approach to Eliminate Silicon Dioxide Substrate Doping to Graphene
发布时间:2018-07-03
点击次数:
发表刊物:Applied Physic Express
合写作者:H. Mizuta, M. Muruganathan, M. Akabori, T. Chikuba, N. Kanetake, J. Sun*, T. Iwasaki
卷号:8
页面范围:015101
是否译文:否
