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Xiao Si

Patents

《MoS2 nano film with controllable antireflection limiting and preparation method thereof》(Authorized)

Patent Applicant:何军, 邢若晨, 张景迪, 肖思

Type of Patent:Utility models

State of Patent:Authorized patents

Application Number:CN 201410366888

Authorization number:CN 104131280 A

Service Invention or Not:no

First Author:肖思