Preparation of SiOC nanocomposite films by laser chemical vapor deposition
发布时间：2021-07-16
点击次数：
DOI码：10.1016/j.jeurceramsoc.2015.10.029
所属单位：中南大学
发表刊物：Journal of European Ceramic Society
关键字：SiOC, LCVD, TEOS, Composite, XPS
摘要：Silicon oxycarbide (SiOC) composite films were prepared by laser chemical vapor deposition (LCVD) under various conditions using tetraethyl orthosilicate (TEOS) as precursor. X-ray diffraction, Fourier transform infrared and X-ray photoelectron spectroscopy data suggest that beta-SiC nano-crystals form in the films at deposition temperatures above 1674K, with SiOC films forming below 1674 K and Si crystals appearing at 1775 K. Composite films containing both SiOC and SiC formed through Si-O bond breaking, the polymerization of silane oligomers, and the subsequent pyrolysis of TEOS during the LCVD process. The appearance of Si at higher temperatures is attributed to the decomposition of SiO and/or to the further oxidation of SiC. The beta-sic nano-crystals in the film are characterized by crystalline SiC cores 100-200 nm in diameter and amorphous SiOC shells 20-30 nm thick. Crown Copyright (C) 2015 Published by Elsevier Ltd. All rights reserved
论文类型：期刊论文
学科门类：工学
一级学科：材料科学与工程
文献类型：J
卷号：36
期号：3
页面范围：403-409
是否译文：否
发表时间：2016-02-17
收录刊物：SCI