Effects of sputtering pressure on nanostructure and nanomechanical properties of AlN films prepared by RF reactive sputtering

Release time:2016-07-15

Journal:Transactions of Nonferrous Metals Society of China

Note:https://doi.org/10.1016/S1003-6326(14)63417-8

Co-author:Zhiming Yu*, Dou Zhang, Kechao Zhou, Jie Li, Danying Liu, Xiongwei Zhang, Qiuping Wei

Document Type:J

Volume:9

Issue:24

Page Number:2845-2855

Translation or Not:no

Date of Publication:2014-08-18