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Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

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  • Release time:2021-07-12

  • Impact Factor:3.627

  • DOI number:10.1016/j.vacuum.2021.110200

  • Journal:Vacuum

  • Co-author:Yonghao Gao, Haibin Pan, Yong Wang

  • First Author:Sihui Wang

  • Indexed by:Journal paper

  • Correspondence Author:Wei Wei

  • Document Code:WOS:000649680500004

  • Discipline:Engineering

  • First-Level Discipline:Materials Science and Engineering

  • Document Type:J

  • Volume:188

  • Page Number:110200

  • Translation or Not:no

  • Date of Publication:2021-06-01

  • Included Journals:SCI、EI

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