High-performance ultra-low-k fluorine-doped nanoporous organosilica films for interlayer dielectric
发布时间：2018-11-07
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发表刊物：Journal of Materials Science
合写作者：W. H. Zhu, Andrew A.O. Tay, Liancheng Wang, Z. Chen, J. H. Li, L. Shi, Z. Ding, G. Zheng, G. L. Li
是否译文：否