Dome-like and dense SiC-SiO2 nanocomposite films synthesized by laser chemical vapor deposition using CO2 laser
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Release time:2021-07-16 DOI number:10.1016/j.surfcoat.2010.10.050 Affiliation of Author(s):中南大学 Journal:Surface & Coatings Technology Key Words:SiC，SiO2，Nanocomposite，Laser CVD Abstract:SIC-SiO2 nanocomposite films were prepared by laser chemical vapor deposition (LCVD) using a CO2 laser; tetraethyl orthosilicate and acetylene were used as precursors. An amorphous phase was formed at a deposition temperature below 1650K, whereas a SiC (3 C) crystalline phase was co-deposited with amorphous SiO2 at a deposition temperature above 1650 K. Dome-like deposits were observed when low total pressure and high temperature were applied. At higher total pressure and lower temperature, the SiC-SiO2 nanocomposite film was obtained, with SiC grains about 10 nm in diameter distributed in amorphous SiO2. The highest deposition rate was 374 mu m h(-1) at 1675 K and 400 Pa Indexed by:Article Discipline:Engineering First-Level Discipline:Materials Science and Engineering Document Type:J Volume:205 Issue:8-9 Page Number:2818-2822 Translation or Not:no Date of Publication:2011-01-25 Included Journals:SCI -
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