Hui Liu, Colm T. O’Mahony, Fabrice Audouin, Claudia Ventura, Michael Morris, Andreas Heise*. Random poly(methyl methacrylate-co-styrene) brushes by ATRP to create neutral surfaces for block copolymer self-assembly. Macromolecular Chemistry and Physics, 2012, 213(1): 108-115
发布时间：2019-03-01
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