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High-performance ultra-low-k fluorine-doped nanoporous organosilica films for interlayer dielectric

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  • Release time:2018-11-07

  • Journal:Journal of Materials Science

  • Co-author:W. H. Zhu, Andrew A.O. Tay, Liancheng Wang, Z. Chen, J. H. Li, L. Shi, Z. Ding, G. Zheng, G. L. Li

  • Translation or Not:no

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